Journal of Vacuum Science & Technology A has published a paper (link: describing the wafer-level uniformity of niobium nitride (NbN) thin films realized by atomic layer deposition (ALD). The paper by Leibniz IPHT and collaborators is being promoted by the journal as an Editor’s Pick. The publication describes a milestone towards a wafer-scale thin film technology required for new quantum devices like the current standard based on coherent quantum phase slip (CQPS) junctions. The ultra-thin films of strongly disordered superconducting NbN are now available from IPHT with high uniformity on wafer areas up to three inches. Thus, enlarged as well as multiple designs with a large number of CQPS junctions can be developed within the Quantum e-leaps project.